US Patent Issued to Tokyo Electron on Feb. 3 for "Etching processing system, method of predicting etching quality, and non-transitory storage medium of etching quality prediction storing a program causing a computer to implement a prediction" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,837, issued on Feb. 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Etching processing system, method of predicting etching quality, and non-transitory storage medium of etching quality prediction storing a program causing a computer to implement a prediction" was invented by Joji Takayoshi (Miyagi, Japan), Hidehiko Sato (Miyagi, Japan), Yuri Kimura (Miyagi, Japan) and Hirokazu Kyokane (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An etching processing system includes a memory, and a processor coupled to the memory and configured to predict etching quality of a substrate by inputting image data of the substrate into a trained mode...