US Patent Issued to Tokyo Electron on Feb. 11 for "Substrate processing system and method for controlling substrate processing system" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 12 -- United States Patent no. 12,224,194, issued on Feb. 11, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and method for controlling substrate processing system" was invented by Atsushi Kubo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system, which includes a transfer device configured to simultaneously transfer a plurality of substrates and suitably corrects positions of the substrate, and a method of controlling the substrate processing system are provided. The substrate processing system includes: a process chamber in which a plurality of substrates is processed; a vacuum transfer chamber connected to the process chamber;...