US Patent Issued to Tokyo Electron on Dec. 9 for "Substrate processing system, information processing apparatus, and information processing method for dynamic control of substrate plasma processing" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,354, issued on Dec. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system, information processing apparatus, and information processing method for dynamic control of substrate plasma processing" was invented by Shuhei Akahane (Miyagi, Japan), Ryu Nagai (Miyagi, Japan) and Koki Tanaka (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes: an acquiring unit that acquires a plurality of types of time-series data for each time when a plasma processing is performed on a substrate; a learning unit that generates a number of learned abnormal value detection models corresponding to a numbe...