US Patent Issued to Tokyo Electron on Dec. 9 for "Plasma processing apparatus, method for manufacturing upper electrode assembly, and method for reproducing upper electrode assembly" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,351, issued on Dec. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus, method for manufacturing upper electrode assembly, and method for reproducing upper electrode assembly" was invented by Makoto Kato (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing apparatus comprising: a plasma processing chamber; a substrate support disposed in the plasma processing chamber; a lower electrode disposed in the substrate support; a conductive member disposed above the substrate support, the conductive member having at least one coolant inlet and at least one coolant outlet, the conductive...