US Patent Issued to Tokyo Electron on Dec. 9 for "Member, manufacturing method of member and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,349, issued on Dec. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Member, manufacturing method of member and substrate processing apparatus" was invented by Takayuki Ishii (Miyagi, Japan), Kazuya Nagaseki (Miyagi, Japan), Michishige Saito (Miyagi, Japan) and Shota Kaneko (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A member to be used in a substrate processing apparatus is provided. The member is formed of aluminum containing silicon, and the silicon has a particle diameter of 1 micro metre or less."

The patent was filed on Oct. 9, 2020, under Application No. 17/066,586.

*For further information, including images, charts and tab...