ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,344, issued on Dec. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatus" was invented by Takehisa Saito (Miyagi, Japan), Yohei Yamazawa (Miyagi, Japan), Toshiki Nakajima (Miyagi, Japan), Daisuke Kurashina (Miyagi, Japan) and Naoki Fujiwara (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided an antenna for inductively coupled plasma excitation. The antenna comprises a plurality of coil assemblies and a conductive plate connected to the plurality of coil assemblies, the conductive plate havi...