US Patent Issued to Tokyo Electron on Dec. 30 for "Temperature control device and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,339, issued on Dec. 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Temperature control device and substrate processing apparatus" was invented by Tomonao Kuwada (Miyagi, Japan) and Kei Kobayashi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A temperature control device includes a first tank that stores a first heat medium; a second tank that stores a second heat medium having a temperature different from a temperature of the first heat medium, and a first communication pipe configured to connect a position where an upper limit level of a height of a liquid level is located in an interior of the first tank and a position where a lo...