US Patent Issued to Tokyo Electron on Dec. 30 for "Gas treatment apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,302, issued on Dec. 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas treatment apparatus" was invented by Yuji Saegusa (Nirasaki, Japan), Tatsuya Handa (Nirasaki, Japan), Reiko Sasahara (Nirasaki, Japan), Kenshiro Asahi (Nirasaki, Japan), Kazuaki Nishimura (Nirasaki, Japan), Akihiro Yoshimura (Nirasaki, Japan) and Masaki Furusawa (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a gas treatment apparatus for performing gas treatment on a substrate. The gas treatment apparatus includes: a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing ...