US Patent Issued to Tokyo Electron on Dec. 30 for "Apparatus for transferring member to be disposed in substrate processing chamber, substrate processing system, and method for transferring member" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,344, issued on Dec. 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Apparatus for transferring member to be disposed in substrate processing chamber, substrate processing system, and method for transferring member" was invented by Wataru Matsumoto (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is an apparatus for transferring a member to be disposed in a substrate processing chamber between a substrate transfer chamber and the substrate processing chamber adjacent to each other, comprising: a valve body that is attached to and detached from an opening through which the substrate transfer chamber and the substrate processing...