ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,488,452, issued on Dec. 2, was assigned to Tokyo Electron Ltd. (Tokyo).
"Wafer bath imaging" was invented by Joel Estrella (Austin, Texas), Ihsan Simms (Austin, Texas), Michael Carcasi (Austin, Texas), Joshua Hooge (Austin, Texas) and Hiroshi Marumoto (Koshi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exemplary method of monitoring a bath process includes processing a first wafer by submerging the first wafer within a bath solution; capturing a video of the bath solution containing the first wafer during a first time interval; analyzing the video based on intensity of light captured in a frame of the video; and based on analyzing the video, ...