ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,488,989, issued on Dec. 2, was assigned to Tokyo Electron Ltd. (Tokyo).
"Method to form narrow slot contacts" was invented by Michael Murphy (Albany, N.Y.), Jodi Grzeskowiak (Albany, N.Y.) and Anton J. Devilliers (Albany, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "In method of patterning a substrate, a first relief pattern is formed based on a first layer deposited over a substrate. Openings in the first relief pattern are filled with a reversal material. The first relief pattern is then removed from the substrate and the reversal material remains on the substrate to define a second relief pattern. A fill material is deposited over the substrate...