US Patent Issued to Tokyo Electron on Dec. 16 for "Temperature control system and system of processing substrate" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,101, issued on Dec. 16, was assigned to Tokyo Electron Ltd. (Tokyo).

"Temperature control system and system of processing substrate" was invented by Haruka Kaneko (Miyagi, Japan), Takehiko Arita (Miyagi, Japan) and Hayato Sakai (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system of processing a substrate includes substrate-processing chambers; target components of temperature control disposed in the respective substrate-processing chambers; a chiller to supply a first temperature-controlling medium with a first flow rate and a second temperature-controlling medium with a second flow rate into the target components; flow controller...