ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,067, issued on Dec. 16, was assigned to Tokyo Electron Ltd. (Tokyo).
"Apparatus for edge control during plasma processing" was invented by Barton Lane (Austin, Texas), Alok Ranjan (Austin, Texas) and Peter Lowell George Ventzek (Austin, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for plasma processing includes a pedestal configured to support a substrate and a conductive structure disposed at the pedestal. The conductive structure is configured to generate a plasma localized at an edge region of the substrate. The conductive structure may be a resonant structure. The apparatus may include a focus ring that has an insulating mat...