US Patent Issued to Tokyo Electron on Aug. 5 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,381,069, issued on Aug. 5, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Akihiro Yokota (Miyagi, Japan), Ryo Terashima (Miyagi, Japan), Tomo Murakami (Miyagi, Japan) and Takaharu Saino (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A disclosed plasma processing apparatus includes a chamber, a plasma generator, a plurality of annular electromagnet units, a power source, at least one optical sensor, and a controller. The plurality of annular electromagnet units are provided coaxially with respect to an axis passing through an internal space of the chamber. The at least...