ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,398,461, issued on Aug. 26, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate cleaning apparatus and substrate cleaning method" was invented by Tsunenaga Nakashima (Koshi, Japan) and Masami Akimoto (Koshi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A particle removed from a substrate is suppressed from adhering to the substrate again. A substrate cleaning apparatus includes a substrate holder configured to hold the substrate; a gas nozzle configured to jet a cleaning gas to the substrate on the substrate holder; and a nozzle cover provided to surround the gas nozzle. The cleaning gas is jetted to a decompression chamber of the nozzle cov...