US Patent Issued to Tokyo Electron on Aug. 12 for "System for processing substrate and maintenance method thereof" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,948, issued on Aug. 12, was assigned to Tokyo Electron Ltd. (Tokyo).

"System for processing substrate and maintenance method thereof" was invented by Takayuki Yamagishi (Tokyo) and Tomohiro Abe (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for processing a substrate using a plurality of vacuum processing chambers is provided. The system comprises: an atmospheric transfer chamber in an atmospheric atmosphere; a vacuum transfer chamber in a vacuum atmosphere; a plurality of processing modules configured by vertically arranging the vacuum processing chamber and a supplementary device; and a load lock chamber configured to sw...