ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,385,127, issued on Aug. 12, was assigned to Tokyo Electron Ltd. (Tokyo).
"Film forming apparatus and film forming method" was invented by Yasunobu Suzuki (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming apparatus for performing film formation on a substrate comprises a processing chamber, a stage configured to place thereon a substrate disposed in the processing chamber, a film forming part configured to perform film formation on the substrate placed on the stage, a shutter that is movable between a shielding position where the substrate on the stage is shielded and a retracted position retracted from the stage and where t...