US Patent Issued to Tokyo Electron on Aug. 12 for "Film forming apparatus, processing condition determination method, and film forming method" (Japanese, American Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,922, issued on Aug. 12, was assigned to Tokyo Electron Ltd. (Tokyo).

"Film forming apparatus, processing condition determination method, and film forming method" was invented by Kenichi Imakita (Albany, N.Y.), Hiroaki Chihaya (Nirasaki, Japan), Toru Kitada (Nirasaki, Japan) and Atsushi Gomi (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming apparatus for forming a film by magnetron sputtering includes a substrate support supporting the substrate, a holder holding a target for emitting sputtered particles, a magnet unit having a magnet, first and second movement mechanisms configured to periodically move the substrate supp...