ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,383,936, issued on Aug. 12, was assigned to Tokyo Electron Ltd. (Tokyo).
"Cleaning method and processing apparatus" was invented by Tomoya Hasegawa (Yamanashi, Japan) and Koji Sasaki (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning method for removing a deposit in a processing chamber is provided. The cleaning method includes adjusting a temperature in the processing chamber to a first temperature; supplying a first gas including a hydrogen fluoride gas into the processing chamber in which the temperature is adjusted to the first temperature; adjusting the temperature in the processing chamber to a second temperature that is h...