US Patent Issued to Tokyo Electron on April 8 for "Substrate liquid processing apparatus and liquid discharge evaluation method" (Japanese Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,269,052, issued on April 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate liquid processing apparatus and liquid discharge evaluation method" was invented by Terufumi Wakiyama (Koshi, Japan), Yuichi Douki (Koshi, Japan), Akinori Tanaka (Koshi, Japan), Minoru Tashiro (Koshi, Japan), Reo Kitayama (Koshi, Japan) and Shu Yamamoto (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A controller is configured to control a liquid supply to change a landing position of a liquid on a surface of a substrate continuously by discharging the liquid toward the surface of the substrate from a first liquid discharge nozzle while moving the first liqu...