US Patent Issued to Tokyo Electron on April 8 for "Process control enabled VDC sensor for plasma process" (Texas Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,520, issued on April 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Process control enabled VDC sensor for plasma process" was invented by Merritt Funk (Austin, Texas), Peter Ventzek (Austin, Texas), Alok Ranjan (Austin, Texas), Barton Lane (Austin, Texas), Justin Moses (Austin, Texas) and Chelsea DuBose (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one exemplary embodiment described herein are innovative plasma processing methods and system that utilize direct measurement of direct current (DC) field or self-bias voltage (Vdc) in a plasma processing chamber. In one embodiment, a non-plasma contact measurement using the electric...