US Patent Issued to Tokyo Electron on April 29 for "Substrate processing apparatus, purge gas control method, and vacuum transfer chamber cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,285,786, issued on April 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus, purge gas control method, and vacuum transfer chamber cleaning method" was invented by Norihiko Amikura (Miyagi, Japan), Hideyuki Osada (Miyagi, Japan), Genichi Nanasaki (Miyagi, Japan), Seiichi Kaise (Miyagi, Japan), Masatomo Kita (Miyagi, Japan), Takashi Takizawa (Miyagi, Japan) and Eiji Takahashi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus is disclosed. The apparatus comprises a vacuum transfer chamber including a top surface, a bottom surface, and side surfaces between the top and the bottom sur...