US Patent Issued to Tokyo Electron on April 29 for "Cyclic method for reactive development of photoresists" (New York Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,578, issued on April 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Cyclic method for reactive development of photoresists" was invented by Hamed Hajibabaeinajafabadi (Albany, N.Y.), Akiteru Ko (Albany, N.Y.), Yu-Hao Tsai (Albany, N.Y.) and Sergey Voronin (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate includes receiving a substrate including a photoresist film including exposed and unexposed portions, etching parts of the unexposed portions of the photoresist film with a developing gas in a process chamber to leave a residual part of the unexposed portions, and purging the developing gas from the pr...