US Patent Issued to Tokyo Electron, FUJIKIN on Dec. 9 for "Gas supply device and semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,383, issued on Dec. 9, was assigned to Tokyo Electron Ltd. (Tokyo) and FUJIKIN Inc. (Osaka, Japan).

"Gas supply device and semiconductor manufacturing apparatus" was invented by Jun Hirose (Miyagi, Japan), Atsushi Sawachi (Miyagi, Japan), Takahiro Matsuda (Osaka, Japan), Kazunari Watanabe (Osaka, Japan), Kohei Shigyou (Osaka, Japan) and Taiki Hoshiko (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas supply device capable of saving space and supplying a mixed gas having components with stable concentration to a processing chamber in a short time includes: a plurality of fluid control units each including a flow path through which gas ...