US Patent Issued to Tokuyama on Oct. 14 for "Method for producing trichlorosilane and method for producing polycrystalline silicon rod" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,441,620, issued on Oct. 14, was assigned to Tokuyama Corp. (Yamaguchi, Japan).

"Method for producing trichlorosilane and method for producing polycrystalline silicon rod" was invented by Junya Sakai (Yamaguchi, Japan), Shoji Iiyama (Yamaguchi, Japan) and Kunihiko Matsumura (Yamaguchi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "[Problem to be solved] Provided is a method that enables effective industrial use of an exhaust gas containing hydrogen to be discharged during production of trichlorosilane.[Solution] Provided is a method for producing trichlorosilane, the method comprising: reacting metallic silicon and tetrachlorosilane with a mixed g...