US Patent Issued to TOKUYAMA on May 27 for "Production method for high-purity hydrogen chloride gas" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,247, issued on May 27, was assigned to TOKUYAMA Corp. (Yamaguchi, Japan).

"Production method for high-purity hydrogen chloride gas" was invented by Akihiro Saito (Yamaguchi, Japan), Dai Tsunoda (Yamaguchi, Japan) and Masayuki Moriwaki (Yamaguchi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a high-purity hydrogen chloride gas comprises performing a purification process that includes the steps 1) to 3) below on a byproduct hydrogen chloride gas: 1) a crude hydrochloric acid generation step of allowing water to absorb the byproduct hydrogen chloride gas; 2) a volatile organic impurity-removed hydrochloric acid generation...