US Patent Issued to TOKUYAMA on April 29 for "Surface-treated sol-gel silica and method for producing same" (Japanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,286,541, issued on April 29, was assigned to TOKUYAMA Corp. (Shunan, Japan).

"Surface-treated sol-gel silica and method for producing same" was invented by Hiromasa Fujioka (Shunan, Japan), Osamu Tanaka (Shunan, Japan), Hiroaki Taira (Shunan, Japan), Naoki Mikami (Shunan, Japan) and Toshiaki Ootani (Shunan, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "This surface-treated sol-gel silica is characterized by containing sol-gel silica having an average particle size of 0.05 micro metre or more and 2.0 micro metre or less as measured by laser diffraction scattering and a surface treatment agent on the surface of the sol-gel silica. In a dispersion pr...