ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,686, issued on Oct. 14, was assigned to TOHOKU UNIVERSITY (Sendai, Japan).
"Semiconductor device" was invented by Junichi Koike (Miyagi, Japan), Masataka Yahagi (Miyagi, Japan) and Yuki Yamada (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a semiconductor device, which has a wiring structure including a single-layer diffusion barrier layer having both a diffusion barrier function and a liner function. The semiconductor device has a wiring structure including an insulating layer, a conductive wiring, and a diffusion barrier layer disposed between the insulating layer and the conductive wiring in a manner of being in contact...