ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,572, issued on Dec. 2, was assigned to THE REGENTS OF THE UNIVERSITY OF MICHIGAN (Ann Arbor, Mich.).
"Mechatronic spatial atomic layer deposition system with closed-loop feedback control of parallelism and component alignment" was invented by Tae H. Cho (Ann Arbor, Mich.), Ellis Herman (Cambridge, Mass.), Orlando Trejo (Ann Arbor, Mich.), Mattison Rose (Ann Arbor, Mich.), Lauren Ransohoff (Brookline, Mass.), Neil Dasgupta (Ann Arbor, Mich.), Kira Barton (Ann Arbor, Mich.), Hyunwoo Park (San Diego) and Andre Brooks (Southgate, Mich.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A spatial atomic layer deposition apparatus that includes a depositor hea...