US Patent Issued to The MathWorks on April 8 for "Providing metric data for patterns usable in a modeling environment" (Indian, American Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,712, issued on April 8, was assigned to The MathWorks Inc. (Natick, Mass.).

"Providing metric data for patterns usable in a modeling environment" was invented by Huanhuan Xu (Wellesley, Mass.), Partha Biswas (Wayland, Mass.), Madhav Rajan (Brighton, Mass.), Sherman Braganza (Brookline, Mass.), Chirag Gupta (Karnataka, India), Neha Pal (Midnapore, India) and Radhey Shyam Meena (Samred Kalan, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one...