ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,081, issued on Feb. 10, was assigned to THE INSTITUTE OF OPTICS AND ELECTRONICS, THE CHINESE ACADEMY OF SCIENCES (Chengdu, China).
"Illumination compensation method" was invented by Xiangang Luo (Sichuan, China), Yanqin Wang (Sichuan, China), Weijie Kong (Sichuan, China), Changtao Wang (Sichuan, China), Ge Yin (Sichuan, China), Yan Tang (Sichuan, China), Yu He (Sichuan, China), Chengwei Zhao (Sichuan, China) and Zeyu Zhao (Sichuan, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "An illumination compensation method, comprising: acquiring working gaps between an imaging film stack and a mask in an exposure imaging system; calculating imaging ligh...