US Patent Issued to THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (GUANGZHOU) on Nov. 25 for "Research wet etching fully automatic system and machine" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,676, issued on Nov. 25, was assigned to THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (GUANGZHOU) (Guangzhou, China).

"Research wet etching fully automatic system and machine" was invented by Wei Xu (Guangdong, China), Yijie Li (Guangdong, China), Xiangjun Zeng (Guangdong, China), Ji Li (Guangdong, China), Nina Wang (Guangdong, China) and Xuemeng Feng (Guangdong, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A research wet etching fully automatic system includes: a machine system for providing a miniaturized machine chamber; an etching system including chemical solution modules in the miniaturized machine chamber, the chemical solution m...