US Patent Issued to THE HONG KONG POLYTECHNIC UNIVERSITY on May 13 for "Method for sonochemical deposition of metals on textile substrates and products thereof" (Chinese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,588, issued on May 13, was assigned to THE HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong).

"Method for sonochemical deposition of metals on textile substrates and products thereof" was invented by Nuruzzaman Noor (Hong Kong) and Suhas Mutalik (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein is a metal coated textile substrate prepared by an ultrasonic irradiation deposition process involving depositing a first plurality of metal nanoparticles on a textile substrate by a first ultrasonic irradiation deposition process thereby forming a metal seeded textile substrate; and depositing a second plurality of metal nanoparticles on t...