US Patent Issued to The Board of Trustees of the University of Illinois on Jan. 13 for "Photoresist-free photolithography, photoprocessing tools, and methods with VUV or deep-UV lamps" (Illinois Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,933, issued on Jan. 13, was assigned to The Board of Trustees of the University of Illinois (Urbana, Ill.).

"Photoresist-free photolithography, photoprocessing tools, and methods with VUV or deep-UV lamps" was invented by James Gary Eden (Champaign, Ill.), Dane Sievers (Fisher, Ill.), Andrey Mironov (Urbana, Ill.) and Jinhong Kim (Champaign, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A fabrication tool has at least one flat lamp photon source, or an array of flat lamps, that serve to non-thermally ablate polymer material from a surface. No photoresist is required and the desired photoablated pattern is determined by inserting a photolithogr...