ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,629, issued on June 10, was assigned to Thales Solutions Asia PTE LTD (Singapore), Centre National De La Recherche Scientifique (Paris), Nanyang Technological University (Singapore) and Universite De Lille (Lille, France).
"Nanostructure transfer method" was invented by Jianxiong Wang (Singapore), Philippe Coquet (Singapore) and Beng Kang Tay (Singapore).
According to the abstract* released by the U.S. Patent & Trademark Office: "A nanostructure transfer method is provided. The method includes providing a first substrate (10) having thereon a plurality of nanostructures (12), the nanostructures (12) extending away from the first substrate (10). A solder material (14) is deposited...