US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING, TSMC NANJING on July 15 for "Method of reducing design rule violations due to IR drops" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,361,197, issued on July 15, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and TSMC NANJING COMPANY Ltd. (Nanjing, China).

"Method of reducing design rule violations due to IR drops" was invented by Fa Zhou (Hsinchu, Taiwan), JinXin Liu (Hsinchu, Taiwan), Chieh-Fu Chu (Hsinchu, Taiwan), Yen-Feng Su (Hsinchu, Taiwan), Chia-Chun Liao (Hsinchu, Taiwan), Meng-Hsuan Wu (Hsinchu, Taiwan) and Dei-Pei Liu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes identifying a cell in the layout diagram as a violated cell that fails to pass one or more design rules related to IR drops, and classifying a ...