ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,385, issued on Dec. 9, was assigned to TEXAS INSTRUMENTS Inc. (Dallas).
"Ramped spin-dry on semiconductor wafer" was invented by Christopher Volk (Lehi, Utah) and Kenneth Bogedahl (Lehi, Utah).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for forming an integrated circuit device, including performing a spin-cleaning step at a first rotational speed on a semiconductor substrate supporting the integrated circuit device at an intermediate stage of manufacturing. A rinse fluid is then dispensed over a top surface of the substrate. A rotational speed of the substrate is increased with a constant acceleration no greater than 125 revol...