US Patent Issued to TES on Oct. 14 for "Method for protecting apparatus from etching substances and method for forming oxide film" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,578, issued on Oct. 14, was assigned to TES Co. LTD (Yongin-si, South Korea).

"Method for protecting apparatus from etching substances and method for forming oxide film" was invented by Kwang-Ki Kim (Yongin-si, South Korea) and Bi-O Lim (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a method of protecting an apparatus from an etching material. The method includes: (a) forming a protective layer on an exposed surface of an apparatus; (b) forming a seasoning layer on the protective layer; (c) performing a deposition process on a wafer that is inserted into the apparatus in which the protective layer and the se...