ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,211, issued on Nov. 25, was assigned to TES Co. LTD (Yongin-si, South Korea).
"Oxygen-doped amorphous carbon film and method for depositing the same" was invented by Seong-Pyo Cho (Yongin-si, South Korea), Seung-Hwan Jeon (Yongin-si, South Korea) and Nam-Seo Kim (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for depositing an amorphous carbon film, the method including: (a) loading a substrate into a process chamber; (b) vacuumizing an inner space of the process chamber; and (c) converting hydrocarbon gas into plasma in the process chamber to deposit an amorphous carbon film on the substrate, wherein in ...