ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,488,982, issued on Dec. 2, was assigned to TES Co. LTD (Yongin-si, South Korea).
"Method of processing substrate" was invented by Joo-Hyun Park (Yongin-si, South Korea), Sang-Hak Yeo (Yongin-si, South Korea), Jae-Ho Lee (Yongin-si, South Korea), Jae-Young Yang (Yongin-si, South Korea) and Kwan-Woo Lee (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a method of processing a substrate that protects the photoresist pattern during the subsequent ion implanting process as well as improve the conformal properties. The method of processing the substrate includes steps of disposing a substrate in a reaction chamber, the s...