US Patent Issued to TERA TECHNOS on Aug. 5 for "Device and method of preparing siox, and siox anode material" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,378,125, issued on Aug. 5, was assigned to TERA TECHNOS Co. LTD (Daejeon, South Korea).

"Device and method of preparing siox, and siox anode material" was invented by Jae Woo Lee (Sejong, South Korea), Jin Gee Park (Daegu, South Korea), Sun Ho Choi (Sejong, South Korea) and Jung Hoon Cheon (Sejong, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a silicon oxide preparation method and a preparation device thereof, and more particularly, to a silicon oxide preparation method capable of continuously preparing silicon oxide by a liquid phase-solid phase reaction by introducing a silicon-based molded body into silic...