ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,818, issued on Dec. 30, was assigned to TEKSCEND PHOTOMASK CORP. (Tokyo).
"Reflective mask blank and reflective mask" was invented by Kenjiro Ichikawa (Tokyo), Ayumi Goda (Tokyo) and Hideaki Nakano (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "There are provided a reflective mask blank in which a fine absorption film pattern is formed even when a high-absorbent material is used as an absorption film of an EUV mask, whereby the shadowing effect can be reduced and electron beam repair etching can be performed and a reflective mask blank for producing the same. A reflective mask blank (10) according to this embodiment includes: a substrate (1);...