US Patent Issued to TDK on Nov. 18 for "Stacked electrode, electrode-equipped strain resistance film, and pressure sensor" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,225, issued on Nov. 18, was assigned to TDK Corp. (Tokyo).

"Stacked electrode, electrode-equipped strain resistance film, and pressure sensor" was invented by Masanori Kobayashi (Tokyo), Ken Unno (Tokyo), Tetsuya Sasahara (Tokyo) and Kohei Nawaoka (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A stacked electrode is provided on a strain resistance film, wherein: the strain resistance film contains Cr and Al; the stacked electrode has a contact layer that overlaps the strain resistance film, a diffusion prevention layer that overlaps the contact layer, and a mounting layer that overlaps the diffusion prevention layer; and the diffusion prevent...