US Patent Issued to TASMIT on March 4 for "Pattern-edge detection method, pattern-edge detection apparatus, and storage medium storing program for causing a computer to perform pattern-edge detection" (Japanese Inventor)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,243,237, issued on March 4, was assigned to TASMIT INC. (Yokohama, Japan).

"Pattern-edge detection method, pattern-edge detection apparatus, and storage medium storing program for causing a computer to perform pattern-edge detection" was invented by Yosuke Okamoto (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method of detecting an edge (or a contour line) of a pattern, which is formed on a workpiece (e.g., a wafer or a mask) for use in manufacturing of semiconductor, from an image generated by a scanning electron microscope. The pattern-edge detection method includes: generating an objective image of...