US Patent Issued to TASMIT on July 1 for "Scanning electron microscope" (Japanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,642, issued on July 1, was assigned to TASMIT INC. (Kanagawa, Japan).

"Scanning electron microscope" was invented by Naoya Saitoh (Yokohama, Japan) and Daisuke Kubota (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a scanning electron microscope configured to scan a workpiece, such as a wafer, mask, panel, or substrate, with an electron beam to generate an image of the workpiece. The scanning electron microscope includes a deflector (17, 18) configured to deflect the electron beam to scan a target region (T) on the workpiece (W) with the electron beam, and a deflection controller (22) configured to app...