US Patent Issued to TAIWAN SSEMICONDUCTOR MANUFACTURING on March 25 for "Slurry compositions for chemical mechanical planarization" (Taiwanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,055, issued on March 25, was assigned to TAIWAN SSEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Slurry compositions for chemical mechanical planarization" was invented by An-Hsuan Lee (Hsinchu, Taiwan), Chun-Hung Liao (Hsinchu, Taiwan), Chen-Hao Wu (Hsinchu, Taiwan), Shen-Nan Lee (Hsinchu County, Taiwan), Teng-Chun Tsai (Hsinchu, Taiwan) and Huang-Lin Chao (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The method includes receiving a semiconductor device having a first surface and a second surface. The first surface is a top surface including a conductive material exposed thereon; and the second surface is an embedded sur...