US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 9 for "Method of manufacturing phase shift photo masks" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,404, issued on Sept. 9, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of manufacturing phase shift photo masks" was invented by Chun-Chieh Tien (Kaohsiung, Taiwan), Cheng-Hsuen Chiang (Miaoli, Taiwan), Chih-Ming Chen (Dasi Township, Taiwan), Cheng-Ming Lin (Siluo Township, Taiwan), Yen-Wei Huang (Tainan, Taiwan), Hao-Ming Chang (Pingtung, Taiwan), Kuo-Chin Lin (Tainan, Taiwan) and Kuan-Shien Lee (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of manufacturing a photo mask, a resist layer is formed over a mask blank, which includes a mask substrate, a phase shift layer dispose...