US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 9 for "Method and structure for mandrel and spacer patterning" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,016, issued on Sept. 9, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method and structure for mandrel and spacer patterning" was invented by Chung-Ming Wang (Chiayi, Taiwan), Chih-Hsiung Peng (Miaoli County, Taiwan), Chi-Kang Chang (New Taipei, Taiwan), Kuei-Shun Chen (Hsinchu, Taiwan) and Shih-Chi Fu (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating a semiconductor device includes generating at least one photomask based on a layout and forming a plurality of active patterns on a substrate, using the at least one photomask. The layout includes a plurality of first p...