US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 9 for "Droplet splash control for extreme ultraviolet photolithography" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,419, issued on Sept. 9, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Droplet splash control for extreme ultraviolet photolithography" was invented by Po-Ming Shih (Hsinchu, Taiwan) and Chi-Hung Liao (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography ...