US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 9 for "Baffle plate for controlling wafer uniformity and methods for making the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,734, issued on Sept. 9, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Baffle plate for controlling wafer uniformity and methods for making the same" was invented by Jr-Sheng Chen (Hsinchu, Taiwan), An-Chi Li (Hsin-Chu, Taiwan), Shih-Che Huang (Zhubei, Taiwan), Chih-Hsien Hsu (Hsinchu, Taiwan), Zhi-Hao Huang (Hsin-Chu, Taiwan), Alex Wang (Hsin-Chu, Taiwan), Yu-Pei Chiang (Hsinchu, Taiwan) and Chun Yan Chen (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Devices and methods for controlling wafer uniformity using a gas baffle plate are disclosed. In one example, a device for plasma-based processes is di...